Effect of pH Value and Electrolyte Concentration on the Copper Sulphide Thin Films Prepared by Chemical Bath Deposition Method

Anuar Kassim, Saravanan NAGALINGAM, Tan wee TEE, Khor Lea KOON, HO SOON MIN
1.944 501

Abstract


Thin films of copper sulphide were deposited using  chemical bath deposition method. The deposition was carried out at various pH values and electrolyte concentrations. The structure, morphology and optical properties of thin films were investigated by means  of X-ray diffraction, atomic force microscopy and UV-Visible spectrophotometer. X-ray diffraction patterns confirmed that the  deposited materials were CuS with hexagonal phase. The films deposited using 0.05 M of copper chloride and sodium thiosulfate solutions at pH 3 showed the best crystallinity, uniform surface coverage and high absorption characteristics. The band gap was found to be 2.6 eV with p-type behaviour.

 

Key Words: Copper sulphide, Chemical bath deposition, thin films, X-ray diffraction.

 


Keywords


Copper sulphide, Chemical bath deposition, thin films, X-ray diffraction

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